A series of polymers is available for coating applications. These polymers are not light sensitive, but may be functionalized to possess specific characteristics for desired performance. The polymers are primarily acetals. Certain ester and urethane polymers are also available.

NEGATIVE DIAZO COMPOUNDS:
Diazo 213	4-diazo diphenylamine bisulfate condensed with paraformaldehyde; 213/S is bisulfate, 213/P is biphosphate, 213/Z is zinc chloride, and 213/T is tosylate
Diazo 413	3-methoxy-4-diazo diphenylamine bisulfate condensed with bis(methoxymethyl) diphenyl ether; 413/M is mesitylene sulfonate, 413/PF is hexafluorophosphate, 413/BN is t-butyl naphthalene sulfonate
Diazo 533	3-methoxy-4-diazo diphenylamine bisulfate condensed with 4,4’-bis(methoxymethyl) diphenyl ether; 533/M is mesitylene sulfonate, 533/PF is hexafluorophosphate, 533/BN is t-butyl naphthalene sulfonate
Diazo 613	3-methoxy-4-diazo diphenylamine bisulfate condensed with1,4-dimethoxymethyl benzene; 613/M is mesitylene sulfonate, 613/PF is hexafluorophosphate, 613/BN is t-butyl naphthalene sulfonate
Diazo 537	4-diazo diphenylamine bisulfate condensed with paraformaldehyde supplied in phosphoric acid as a 70% solution
Diazo 548	2,5-diethoxy-4-diazo tolyl mercaptobenzene condensed with paraformaldehyde; 548/S is bisulfate, 548/Z is zinc chloride, 548/P is biphosphate
Diazo 636	3-methoxy-4-diazo diphenylamine bisulfate condensed with1,4-dimethoxymethyl benzene is supplied in phosphoric acid as a 50% solution
POSITIVE DIAZO COMPOUNDS:
Diazo DHB-xx	2-diazo-1-naphthol-5-sulfo ester with 2,4-dihydroxy benzophenone. xx is the degree of substitution of the hydroxyl groups based upon customer requirements.
Diazo THB-xx	2-diazo-1-naphthol-5-sulfo ester with 2,3,4-trihydroxy benzophenone. xx is the degree of substitution of the hydroxyl groups based upon customer requirements.
Diazo TeHB-xx	2-diazo-1-naphthol-5-sulfo ester with tetrahydroxy benzophenone. xx is the degree of substitution of the hydroxyl groups based upon customer requirements.
NOVOLAK RESINS:
Resin P-1	condensation product of m-cresol and formaldehyde
Resin P-2	condensation product of o- and p-cresol and formaldehyde
Resin P-4	co-condensation product of phenol and o- and p-cresol with formaldehyde
Resins PDS	Resins P-1, P-2 and P-3 capped with 2-diazo-1-naphthol-5-sulfonyl chloride; designated respectively as PDS-1, PDS-2 and PDS-3. The degree of capping is based upon the end application
PHOTOACID GENERATOR:
PAG-250	4-diazo diphenylamine hexafluorophosphate
PAG-500	3-methoxy-4-diazo diphenylamine hexafluorophosphate
POLYMERS (BINDER) RESINS:
DT-1	Polyvinyl / alcohol / acetate / acetal with pendant carboxyl group; Mw ~45,000
DT-3	Polyvinyl / alcohol / acetate / acetal with pendant carboxyl group; Mw ~72,000
DT-5	Polyvinyl / alcohol / acetate / acetal / ester with pendant carboxyl group; Mw ~60,000

PLATEROOM AND PRESSROOM CHEMICALS:
There is a complete offering of plateroom and pressroom chemicals. The most common products are: developers, finishers, plate cleaners, plate cleaner / preserver, scratch remover, on-the-fly cleaner, roller washes, blanket washes, fountain solutions and alcohol substitutes. Other products are available upon request.

Patenting support is available for those wishing to patent an invention or for searching to insure that infringement will not be a concern.

With the present manufacturing capability, it is not necessary that all products made be of our design. We do toll manufacturing and private labeling for products that fit into our area of capability and competency. The mixing, filling and packaging operation handles solutions with viscosities ranging from water to gels.

If a potential client has a formulation or process they want produced, we will evaluate the product and provide the best quality and price if it fits our abilities.